I am currently studying for a PhD
at Cranfield University.
The topic is ‘Ultra-precision etching of
silicon-based materials using a reactive atom plasma.’
My PhD
project is being sponsored by the
Research Councils Basic Technology Program and is part of a bigger
project entitled
‘Ultra-Precision Surfaces – a new paradigm’. Part of the aim is assist
with the production of telescopic mirror sections, up to 1m in
diameter. The aim of the project is to
produce surfaces which are ten times as accurate and make them ten
times as
quickly compared to the current state of the art. The project is in
collaboration with Technium
OpTIC in North Wales and Zeeko Ltd. Reactive
Atomic Plasma machining is a process that was patented by RAPT
industries in 2002. I surface is
etched to ultra-fine presision using a reactive gas within an argon
plasma shield. For convenience, we usually refer to the etching
process as RAPT. It has been
identified as a alternative to broad ion beam figuring (or BIBF). RAPT
has the big advantage in that it can be operated in atmospheric
pressure, whereas BIBF only works in a vacuum.
As well as showing excperimentally how finer
surfaces RAPT can produce on materials like ULE, I shall also be doing
spectroscopic studies on the plasma torch and temperature mapping of
the samples while they are being etched.
My supervisors are Professor Paul Shore and Professor John Nicholls. I am also working closely with Dr. Carlo Fanara.
To see a video of RAP, click here.